The AFM5500M is a SPM platform equipped with a fully addressable 4-inch stage, optimized for medium-sized samples. It affords exceptional levels of ease of use, automation, and accuracy, as well as correlation for AFM/SEM investigations.
Ease of Use
Significantly simplifying the AFM operation
- Wide-open tip and sample access
- Fully addressable 4-inch stage eliminating the need for sample remount/rotation
- Point-and-click function enabling easy and quick camera-based sample navigation
- All built-in accessories allowing seamless and software-controlled mode switching
Easier, faster, and more precise AFM imaging
- Automated cantilever exchange
- Automated laser alignment
- Automated image optimization (RealTune® II)
- Automated AFM measurements following a recipe
Enhanced accuracy of AFM measurements
- Flexure-based design providing superior flat and orthogonal scan
- Closed-loop scanner allowing highly linear and accurate imaging
- Low sensor noise yielding high-resolution and high-quality results
- Tip evaluation capability ensuring probe quality and artifact-free images
Conventional AFM with a piezoelectric tube scanner requires data flattening or leveling because of its intrinsic curved motion. However, this flattening may distort a sample' s micro-surface structure, including its Z value. The newly developed AFM5500M is equipped with a flexure-based scanner that enables well-controlled raster scans along X and Y directions only. As a result, this advanced scanner design can effectively eliminate background curvatures in a wide scan area and improve the accuracy of AFM measurements.
Using a conventional piezoelectric tube scanner can cause cross-talk when bending the tube scanner.
This cross-talk leads to distortions and asymmetrization. The improved AFM5500M’s scanner reduces cross-talk making both accurate and symmetric measurements possible.
Correlative AFM and SEM Imaging
The Hitachi-proprietary SEM/AFM shared alignment holder provides quick and easy measurements and analysis of topography, structures, composition, and surface property.
AFM and SEM Measurements of the Same Area (Sample:Graphene/SiO2)
Overlay images of SEM, AFM (topography), and KFM (surface potential)
- It can be concluded from AFM cross-session height measurements that those contrast differences in the SEM image are corresponding to the variation of graphene layers in the AFM image.
- It indicates that surface potential (work function) of graphene sheets is highly dependent on the sample thickness, i.e., the number of graphene layers.
- High-precision 3D topographic data in conjunction with the electrical property examination provide strong evidence for identifying the root cause of captured variations in SEM contrasts.
Hitachi High-Tech Science will continue to develop AFM-correlated systems with other types of microscopes and inspection equipment.