ULVAC PHI GENESIS Fully-automated multi-technique scanning XPS/HAXPES

[Background] Advanced materials such as all-solid-state batteries, advanced semiconductors, and artificial photosynthesis are complex combinations of materials, and their research and development require speed in optimizing the performance of each material as well as the combination of materials. There is a growing need for high-performance and highly functional surface and interface analysis that can dramatically […]

ULVAC PHI nanoTOF ３+ Time-of-Flight Secondary Ion Mass Spectrometry

ULVAC PHI’s Latest Generation of TOF-SIMS, having a Modern Ergonomic Package, Smaller Footprint, and Advanced Features KEY TECHNOLOGY Triple Focusing Electrostatic Analyzerfor Complex Sample Geometries TRIFT Analyzer for a Wide Range of Sample Geometries,Wide Bandpass Energy, and Wide Acquisition Angle In exactly the same mass will have different flight times in the analyzer. This is […]

Ulvac PHI nanoTOF Time-of-flight Secondary Ion Mass Spectroscope (TOF-SIMS)

Further Developed Pulsed Ion Source ensures high quality results Minimum beam diameter is 70 nm or less Ion source can be selected from gallium, gold, and bismuth. Performance of the newly developed pulsed ion source The newly developed pulsed ion source enables a minimum spatial resolution of 70 nm or less. The newly designed bunching […]

Ulvac PHI 710 Auger Electron Spectroscopy (AES, SAM)

SEM resolution ≤ 3 nm, AES resolution ≤ 8 nm In Auger analysis (spectrum, depth profile or mapping), it is necessary to set AES analysis point with SEM image. A fine focused electron beam is required for SEM imaging and an extremely stable electron beam at enough current for AES analysis is required at a […]