Failure Analysis,
Material Characterization
and Metrology Equipment

Scanning Electron Microscopes, Transmission Electron Microscopes, Atomic Force Microscopes, Raman Microscopes, Thermal Analyzers, FTIR, Failure Analysis Systems, Sample Preparation Equipment, Scanning Acoustic Microscopes, Optical Microscopes, X-Ray Photoelectron Spectroscopy, Auger Electron Spectroscopy, and more.

Failure Analysis, Material Characterization and Metrology Equipment

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This new generation of the long-standing Hitachi tabletop microscopes (TM) integrates ease of use, optimized imaging, and high-image quality, while maintaining compact design
This new generation of the long-standing Hitachi tabletop microscopes (TM) integrates ease of use, optimized imaging, and high-image quality, while maintaining compact design
The PHEMOS-X is a high-resolution emission microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects.
The PHEMOS-X is a high-resolution emission microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects.
STA (simultaneous thermogravimetric analysis) measures DSC and TGA simultaneously in a single unit.
STA (simultaneous thermogravimetric analysis) measures DSC and TGA simultaneously in a single unit.
The AFM100 Series is Hitachi’s next generation probe microscopy platform.
The AFM100 Series is Hitachi’s next generation probe microscopy platform.
The top of the line ion-milling system for producing exceptional quality cross section or flat-milling samples for electron microscopy.
The top of the line ion-milling system for producing exceptional quality cross section or flat-milling samples for electron microscopy.
The IM4000Plus Ion Milling System utilizes a broad, low-energy Ar+ ion beam milling method to produce wider, undistorted cross-section milling or flat milling.
The IM4000Plus Ion Milling System utilizes a broad, low-energy Ar+ ion beam milling method to produce wider, undistorted cross-section milling or flat milling.
The MC1000 Ion Sputter Coater is a sample preparation instrument for use with a Scanning Electron Microscope (SEM) designed to deposit a thin metal coating, such as platinum (Pt), gold (Au), platinum-
The MC1000 Ion Sputter Coater is a sample preparation instrument for use with a Scanning Electron Microscope (SEM) designed to deposit a thin metal coating, such as platinum (Pt), gold (Au), platinum-
Hitachi High-Tech’s scanning electron microscopes SU3800/SU3900 deliver both operability and expandability. The operator can automate many operations and efficiently utilize their high performance.
Hitachi High-Tech’s scanning electron microscopes SU3800/SU3900 deliver both operability and expandability. The operator can automate many operations and efficiently utilize their high performance.
Ethos offers powerful solutions integrated into a single platform including low-acceleration Ar/Xe ion-beam processing when configured as a Triple-Beam system.
Ethos offers powerful solutions integrated into a single platform including low-acceleration Ar/Xe ion-beam processing when configured as a Triple-Beam system.
The SU8600 incorporates a highbrightness cold-field emitter (CFE) to allow acquisition of ultra-high-resolution images even at low accelerating voltages.
The SU8600 incorporates a highbrightness cold-field emitter (CFE) to allow acquisition of ultra-high-resolution images even at low accelerating voltages.
DSC is used to measure heat flow for material characterization by providing thermal properties such as melting point, glass transition and crystallization.
DSC is used to measure heat flow for material characterization by providing thermal properties such as melting point, glass transition and crystallization.
The Cold Field Emission source is ideal for high-resolution imaging with a small source size and energy spread. Innovative CFE Gun technology contributes the ultimate FE-SEM with superior beam bright
The Cold Field Emission source is ideal for high-resolution imaging with a small source size and energy spread. Innovative CFE Gun technology contributes the ultimate FE-SEM with superior beam bright

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failure analysis, material characterization, and metrology equipment

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