Failure Analysis, Material Characterization, Metrology Equipment

Semiconductor Inspection System

Infrared Microscope

IR-2200

IR-2200 Microscope System enables the user to inspect sub-surface images including MEMS device, 3D stacks, incoming wafers, photovoltaic and wafer level CSP’s with an astonishing level of precision.

IR-2200 Microscope System enables the user to inspect sub-surface images including MEMS device, 3D stacks, incoming wafers, photovoltaic and wafer level CSP’s with an astonishing level of precision.

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IR-2200 Microscope System enables the user to inspect sub-surface images including MEMS device, 3D stacks, incoming wafers, photovoltaic and wafer level CSP’s with an astonishing level of precision.

The IR-2200 Infrared Microscope system integrates the infrared table top microscope system with software and 4.1 Megapixel USB-3.0 NIR Camera.

Capable of high precision measurements, image capture, verification and inspection of materials transparent to the near infrared (NIR) / Shortwave Infrared (SWIR) wavelengths.

High end Seiwa NIR microscope for observing inside of semiconductor devices such as wafers, chips, MEMs and CSPs using characteristics of infrared light.

Able to observe wavelength of up to 1550nm, providing high contrast images compared to existing microscopes which can observe up to 1100nm.
Manual XY stage (Size 125mm x 125mm / Moving distance=±25mm ).
Koehler coaxial illumination port.
Objective lens with high transmittance %, focal length = 200mm.
Built in image processing software to further provide clarity to image

Infrared Microscope Philippines — Infrared Microscope Philippines

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IR-2200

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