Failure Analysis, Material Characterization, Metrology Equipment

Semiconductor Inspection System

Infrared Microscope

IR-2200

IR-2200 Microscope System enables the user to inspect sub-surface images including MEMS device, 3D stacks, incoming wafers, photovoltaic and wafer level CSP’s with an astonishing level of precision.

IR-2200 Microscope System enables the user to inspect sub-surface images including MEMS device, 3D stacks, incoming wafers, photovoltaic and wafer level CSP’s with an astonishing level of precision.

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IR-2200 Microscope System enables the user to inspect sub-surface images including MEMS device, 3D stacks, incoming wafers, photovoltaic and wafer level CSP’s with an astonishing level of precision.

The IR-2200 Infrared Microscope system integrates the infrared table top microscope system with software and 4.1 Megapixel USB-3.0 NIR Camera.

Capable of high precision measurements, image capture, verification and inspection of materials transparent to the near infrared (NIR) / Shortwave Infrared (SWIR) wavelengths.

High end Seiwa NIR microscope for observing inside of semiconductor devices such as wafers, chips, MEMs and CSPs using characteristics of infrared light.

Able to observe wavelength of up to 1550nm, providing high contrast images compared to existing microscopes which can observe up to 1100nm.
Manual XY stage (Size 125mm x 125mm / Moving distance=±25mm ).
Koehler coaxial illumination port.
Objective lens with high transmittance %, focal length = 200mm.
Built in image processing software to further provide clarity to image

Infrared Microscope Philippines — Infrared Microscope Philippines

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IR-2200

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IR-2200

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IR-2200 Microscope System enables the user to inspect sub-surface images including MEMS device, 3D stacks, incoming wafers, photovoltaic and wafer level CSP’s with an astonishing level of precision.

IR-2200 Microscope System enables the user to inspect sub-surface images including MEMS device, 3D stacks, incoming wafers, photovoltaic and wafer level CSP’s with an astonishing level of precision.

Wafer Inspection System

Wafer Inspection System

Seiwa Wafer review system visually inspects the defect location detected from AOI systems. This review system is able to capture the visual data and add it to previous inspection results.

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PHI 710

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Auger Electron Spectroscopy (AES, SAM)

Auger Electron Spectroscopy (AES, SAM)

The only scanning Auger nanoprobe in the world that guarantees a field emission electron source whose spatial resolution is 8 nm or less.

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RM5

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Raman Microscope

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SU9000

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The Cold Field Emission source is ideal for high-resolution imaging with a small source size and energy spread. Innovative CFE Gun technology contributes the ultimate FE-SEM with superior beam bright

The Cold Field Emission source is ideal for high-resolution imaging with a small source size and energy spread. Innovative CFE Gun technology contributes the ultimate FE-SEM with superior beam bright

iPHEMOS MPX

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The iPHEMOS-MPX is a high-resolution Inverted Emission Microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects.

The iPHEMOS-MPX is a high-resolution Inverted Emission Microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects.