The ZONESEMⅡ Tabletop Sample Cleaner uses UV-based cleaning technology to minimize or eliminate hydrocarbon contamination for electron microscopy imaging.

ZONESEMⅡ Sample Cleaner

ZONESEMⅡ

Designed specifically for Hitachi specimen holders, the ZONESEMⅡ provides optimized sample cleaning and storage modes of operation. The ZONESEMⅡ serves as an excellent desiccator to prevent holder out-gassing.

  • Easy-to-use touchscreen panel
  • Programmable up to 24hrs
  • Variable pressure control

Cause of contamination

Interactions between hydrocarbons on the specimen surface and the irradiated electron beam generate sample contamination. Hydrocarbons are generally non-covalently attached to the specimen surface during sample handling, preparation, and storage.

Sample Cleaning Necessary

Cleaning Process

The ZONESEMⅡ uses a UV lamp with wavelengths of 185 nm and 254 nm to efficiently remove hydrocarbons. Ozone is generated from oxygen in the vacuum-controlled specimen chamber, and generated ozone is broken into oxygen and activated oxygen. Hydrocarbons on the specimen surface are broken into volatile molecules such as CO2, H2O by radical oxygen and UV. The exhaust pump evacuates the free molecules from the sample chamber.

Cleaning Process
ZONESEMⅡ Sample Cleaner

For more information, contact us.

See more on Hitachi’s website

 

Hitachi Sample Preparation Equipment available through Sigmatech Inc. Philippines About us

Features

ZONESEMⅡ

ZONESEMⅡ

Designed specifically for Hitachi specimen holders, the ZONESEMⅡ provides optimized sample cleaning and storage modes of operation. The ZONESEMⅡ serves as an excellent desiccator to prevent holder out-gassing.

  • Easy-to-use touchscreen panel
  • Programmable up to 24hrs
  • Variable pressure control

Cause of contamination

Interactions between hydrocarbons on the specimen surface and the irradiated electron beam generate sample contamination. Hydrocarbons are generally non-covalently attached to the specimen surface during sample handling, preparation, and storage.

Sample Cleaning Necessary

Cleaning Process

The ZONESEMⅡ uses a UV lamp with wavelengths of 185 nm and 254 nm to efficiently remove hydrocarbons. Ozone is generated from oxygen in the vacuum-controlled specimen chamber, and generated ozone is broken into oxygen and activated oxygen. Hydrocarbons on the specimen surface are broken into volatile molecules such as CO2, H2O by radical oxygen and UV. The exhaust pump evacuates the free molecules from the sample chamber.

Cleaning Process

See more on Hitachi’s website

 

Hitachi Sample Preparation Equipment available through Sigmatech Inc. Philippines About us

Related Products

ASAP-1® has become the standard preparation equipment that engineers involved in disciplines such as failure analysis, yield enhancement and competitive analysis.
The Insight-Scan (IS) series of Scanning Acoustic Microscopes(SAM) integrates the finest state-of-the-art technology for high resolution, high speed, fully digital non-destructive sample analysis.
ULTRAPOL Basic lapping and polishing machine offers the build-quality required for high precision manual polishing of materials for production, research and NAND flash chip-off in digital forensics
The IS-202 Scanning Acoustic Microscope combines highest resolution with a very compact mechanical set-up.
Ultraslice Macrotome is a low-cost sectioning system designed for mobile chips, devices, and various industrial samples. This system is known for its precision and versatility.
The SU7000 is the ultimate high-performance all-rounder: an ultra high resolution Schottky FESEM offering nanoscale imaging and powerful analysis
The iPHEMOS-MPX is a high-resolution Inverted Emission Microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects.
The ZONESEMⅡ Tabletop Sample Cleaner uses UV-based cleaning technology to minimize or eliminate hydrocarbon contamination for electron microscopy imaging.
The SU8600 incorporates a highbrightness cold-field emitter (CFE) to allow acquisition of ultra-high-resolution images even at low accelerating voltages.
PHI’s Latest Generation of TOF-SIMS, having a Modern Ergonomic Package, Smaller Footprint, and Advanced Features

How can we help?

You may contact our specialists by accomplishing form below.

failure analysis, material characterization, and metrology equipment

Subscribe to newsletter

Sign up for our newsletter to get updates on promos, seminars, events, products, application notes and more.

Inquire for this Product

ZONESEMⅡ​
Sample Cleaner​
ZONESEMⅡ​
Sample Cleaner​