The ZONESEMⅡ Tabletop Sample Cleaner uses UV-based cleaning technology to minimize or eliminate hydrocarbon contamination for electron microscopy imaging.

ZONESEMⅡ Sample Cleaner

ZONESEMⅡ

Designed specifically for Hitachi specimen holders, the ZONESEMⅡ provides optimized sample cleaning and storage modes of operation. The ZONESEMⅡ serves as an excellent desiccator to prevent holder out-gassing.

  • Easy-to-use touchscreen panel
  • Programmable up to 24hrs
  • Variable pressure control

Cause of contamination

Interactions between hydrocarbons on the specimen surface and the irradiated electron beam generate sample contamination. Hydrocarbons are generally non-covalently attached to the specimen surface during sample handling, preparation, and storage.

Sample Cleaning Necessary

Cleaning Process

The ZONESEMⅡ uses a UV lamp with wavelengths of 185 nm and 254 nm to efficiently remove hydrocarbons. Ozone is generated from oxygen in the vacuum-controlled specimen chamber, and generated ozone is broken into oxygen and activated oxygen. Hydrocarbons on the specimen surface are broken into volatile molecules such as CO2, H2O by radical oxygen and UV. The exhaust pump evacuates the free molecules from the sample chamber.

Cleaning Process
ZONESEMⅡ Sample Cleaner

For more information, contact us.

See more on Hitachi’s website

 

Hitachi Sample Preparation Equipment available through Sigmatech Inc. Philippines About us

Features

ZONESEMⅡ

ZONESEMⅡ

Designed specifically for Hitachi specimen holders, the ZONESEMⅡ provides optimized sample cleaning and storage modes of operation. The ZONESEMⅡ serves as an excellent desiccator to prevent holder out-gassing.

  • Easy-to-use touchscreen panel
  • Programmable up to 24hrs
  • Variable pressure control

Cause of contamination

Interactions between hydrocarbons on the specimen surface and the irradiated electron beam generate sample contamination. Hydrocarbons are generally non-covalently attached to the specimen surface during sample handling, preparation, and storage.

Sample Cleaning Necessary

Cleaning Process

The ZONESEMⅡ uses a UV lamp with wavelengths of 185 nm and 254 nm to efficiently remove hydrocarbons. Ozone is generated from oxygen in the vacuum-controlled specimen chamber, and generated ozone is broken into oxygen and activated oxygen. Hydrocarbons on the specimen surface are broken into volatile molecules such as CO2, H2O by radical oxygen and UV. The exhaust pump evacuates the free molecules from the sample chamber.

Cleaning Process

See more on Hitachi’s website

 

Hitachi Sample Preparation Equipment available through Sigmatech Inc. Philippines About us

Related Products

The AFM100 Series is Hitachi’s next generation probe microscopy platform.
The IM4000Plus Ion Milling System utilizes a broad, low-energy Ar+ ion beam milling method to produce wider, undistorted cross-section milling or flat milling.
DSC is used to measure heat flow for material characterization by providing thermal properties such as melting point, glass transition and crystallization.
ASAP-1® has become the standard preparation equipment that engineers involved in disciplines such as failure analysis, yield enhancement and competitive analysis.
The K850 combines versatility and ease of operation. Built-in thermo-electric heating and adiabatic cooling allow precise temperature control.
Seiwa Wafer review system visually inspects the defect location detected from AOI systems. This review system is able to capture the visual data and add it to previous inspection results.
IR-2200 Microscope System enables the user to inspect sub-surface images including MEMS device, 3D stacks, incoming wafers, photovoltaic and wafer level CSP’s with an astonishing level of precision.
The iPHEMOS-MPX is a high-resolution Inverted Emission Microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects.
With options for both oxidizing and non-oxidizing metals, as well as carbon evaporation, Quorum coaters are suitable for applications, including high-resolution SEM and FIB-SEM, ensuring precise resu
The only scanning Auger nanoprobe in the world that guarantees a field emission electron source whose spatial resolution is 8 nm or less.

How can we help?

You may contact our specialists by accomplishing form below.

failure analysis, material characterization, and metrology equipment

Subscribe to newsletter

Sign up for our newsletter to get updates on promos, seminars, events, products, application notes and more.

Inquire for this Product

ZONESEMⅡ​
Sample Cleaner​
ZONESEMⅡ​
Sample Cleaner​