Seiwa Wafer review system visually inspects the defect location detected from AOI systems. By importing the inspection system data results from the AOL, this review system is able to capture the visual data and add it to previous inspection results.

Seiwa Wafer review system visually inspects the defect location detected from AOI systems. By importing the inspection system data results from the AOL, this review system is able to capture the visual data and add it to previous inspection results.

Seiwa Wafer inspection system visually inspects the defect location detected from AOI systems. By importing the inspection system data results from the AOL, this review system is able to capture the visual data and add it to previous inspection results.

Brochure >

Related Products

The iPHEMOS-MPX is a high-resolution Inverted Emission Microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects.
The iPHEMOS-MPX is a high-resolution Inverted Emission Microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects.
The MC1000 Ion Sputter Coater is a sample preparation instrument for use with a Scanning Electron Microscope (SEM) designed to deposit a thin metal coating, such as platinum (Pt), gold (Au), platinum-
The MC1000 Ion Sputter Coater is a sample preparation instrument for use with a Scanning Electron Microscope (SEM) designed to deposit a thin metal coating, such as platinum (Pt), gold (Au), platinum-
DSC is used to measure heat flow for material characterization by providing thermal properties such as melting point, glass transition and crystallization.
DSC is used to measure heat flow for material characterization by providing thermal properties such as melting point, glass transition and crystallization.
A high‑performance benchtop FTIR, the IR5 is ideal for everyday analysis, delivering fast and accurate IR measurements.
A high‑performance benchtop FTIR, the IR5 is ideal for everyday analysis, delivering fast and accurate IR measurements.
Ethos offers powerful solutions integrated into a single platform including low-acceleration Ar/Xe ion-beam processing when configured as a Triple-Beam system.
Ethos offers powerful solutions integrated into a single platform including low-acceleration Ar/Xe ion-beam processing when configured as a Triple-Beam system.
The IM4000Plus Ion Milling System utilizes a broad, low-energy Ar+ ion beam milling method to produce wider, undistorted cross-section milling or flat milling.
The IM4000Plus Ion Milling System utilizes a broad, low-energy Ar+ ion beam milling method to produce wider, undistorted cross-section milling or flat milling.
The top of the line ion-milling system for producing exceptional quality cross section or flat-milling samples for electron microscopy.
The top of the line ion-milling system for producing exceptional quality cross section or flat-milling samples for electron microscopy.
Compact and fully automated, designed for high-performance confocal Raman imaging. Experience intuitive use with advanced spectral precision.
Compact and fully automated, designed for high-performance confocal Raman imaging. Experience intuitive use with advanced spectral precision.

Product added to Quote list ✔

failure analysis, material characterization, and metrology equipment

Subscribe to newsletter

Sign up for our newsletter to get updates on promos, seminars, events, products, application notes and more.

Inquire for this Product

Wafer Inspection System
Wafer Inspection System